ASTM D5127-13 (2018) PDF

Full title and description

ASTM D5127-13 (Reapproved 2018) — Standard Guide for Ultra‑Pure Water Used in the Electronics and Semiconductor Industries. Provides classifications, recommended quality parameters, and guidance for ultra‑pure water (UPW) intended for use in semiconductor and electronics manufacturing at the point of distribution.

Abstract

This guide describes recommended water quality levels, monitoring practices, and typical analytical methods for ultra‑pure water used in semiconductor and electronics fabrication. Seven classes of water quality are defined to support increasingly stringent device geometries and processes; the guide focuses on properties such as resistivity/conductivity, total organic carbon (TOC), dissolved gases, trace ionic and metallic contaminants, and residue after evaporation. Recommendations apply to water at the point of distribution (POD).

General information

• Status: Current (D5127-13, reapproved 2018)
• Publication date: Original revision 2013; current edition reapproved Oct 15, 2018 (published 2018).
• Publisher: ASTM International
• ICS / categories: 13.060.25 (Water for industrial use); 71.100.99 (Other products of the chemical industry)
• Edition / version: D5127-13 (R2018) — originally approved 2013, reapproved 2018
• Number of pages: 6

Scope

This guide provides recommendations for the quality of water used in electronics and semiconductor manufacturing, including cleaning, rinsing, steam generation, photomask preparation, thin‑film and device fabrication. It defines seven water classifications, gives target parameter ranges for UPW at the point of distribution (POD), and identifies relevant test methods and on‑line monitoring approaches. It does not dictate system design or safety practices and users must determine applicability and regulatory requirements for their operations.

Key topics and requirements

• Seven classifications of ultra‑pure water tailored to process demands and device line widths (including sub‑0.1 µm geometries).
• Key water quality parameters: resistivity/conductivity, total organic carbon (TOC), dissolved oxygen, particle counts, ionic contaminants (e.g., Na, K), trace metals, and residue after evaporation.
• Point‑of‑distribution (POD) measurement emphasis — recommendations apply to water at the POD, not upstream raw sources.
• References to established analytical and on‑line test methods (examples: ASTM D1193, D5391, D5544, D5673, D1976, D2791 and others) for measurement and monitoring.
• Guidance on specifying monitoring frequency, acceptable limits for common contaminants, and considerations for ultra‑clean processing environments.

Typical use and users

Used by semiconductor and microelectronics manufacturers, process engineers, UPW system designers and service providers, quality and contamination control engineers, analytical laboratories, and consultants who specify, monitor, or validate ultra‑pure water for fabrication processes and advanced device manufacturing.

Related standards

Commonly referenced ASTM standards and guides related to D5127 include: D1193 (reagent water specification), D5391 (electrical conductivity/resistivity of flowing UPW), D5173/D4453 (handling and sampling of high‑purity water), D5542/D5544 (trace anions and residue after evaporation), D5673 (ICP‑MS for trace elements), D1976 (ICP‑AES), D2791 (on‑line sodium), D5173 (TOC monitoring) and other D19 committee documents covering UPW measurement and monitoring.

Keywords

ultra‑pure water, UPW, semiconductor water, electronics manufacturing, TOC, resistivity, conductivity, trace metals, particle control, point of distribution, water classification, ASTM D5127

FAQ

Q: What is this standard?

A: ASTM D5127 is a guide that provides recommended water quality classifications and measurement guidance for ultra‑pure water used in electronics and semiconductor manufacturing (designation D5127‑13, reapproved 2018).

Q: What does it cover?

A: It covers recommended quality targets and monitoring considerations for UPW at the point of distribution, including parameters such as resistivity/conductivity, TOC, dissolved gases, particle counts, ionic contaminants, trace metals, and residue after evaporation, plus references to relevant test methods.

Q: Who typically uses it?

A: Semiconductor fabs, electronics manufacturers, UPW system designers and vendors, process and contamination control engineers, analytical labs, and consultants specifying or validating UPW quality.

Q: Is it current or superseded?

A: The active edition is D5127‑13, reapproved in 2018 (often shown as D5127‑13 (R2018)). Users should verify with ASTM International for any revisions published after 2018.

Q: Is it part of a series?

A: Yes — it is part of the ASTM D19 committee work on water and is commonly used alongside related D19 standards and guides for sampling, analysis, and on‑line monitoring of high‑purity and reagent waters (for example D1193, D5391, D5544, D5673, etc.).

Q: What are the key keywords?

A: Ultra‑pure water, UPW, semiconductor water, TOC, resistivity, conductivity, trace metals, particle control, point of distribution, water classification.