Semiconductor devices. Micro-electromechanical devices - Forming limit measuring method of metallic film materials
Semiconductor devices. Micro-electromechanical devices - Forming limit measuring method of metallic film materials
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What is BS EN 62047-14 - Forming limit of metallic film materials used in micro electromechanical devices about?
BS EN 62047-14 is the 14th part of multi-series standard used for Semiconductor devices that specifies the measuring method for forming limit of metallic film materials used in micro-electromechanical devices. BS EN 62047-14 is useful in manufacturing good quality metallic film materials used in these devices. BS EN 62047-14 describes definitions and procedures for measuring the forming limit of metallic film materials with a thickness range from 0,5 μm to 300 μm. The metallic film materials described herein are typically used in electric components, MEMS and microdevices. When metallic film materials used in MEMS (see 2.1.2 of IEC 62047-1:2005) are fabricated by a forming process such as imprinting, it is necessary to predict the material failure in order to
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