Overview
ISO/TS 15338:2025 - "Surface chemical analysis - Glow discharge mass spectrometry - Operating procedures" is a Technical Specification that defines recommended operating procedures for glow discharge mass spectrometry (GD‑MS). This third edition updates the 2020 version and is intended to be read alongside instrument manufacturers’ manuals. It covers the principles of glow discharge ion sources, differences between commercial GD‑MS systems, routine operations, calibration, data acquisition and quantification methods used in surface chemical analysis.
Key topics and requirements
The document addresses practical and technical aspects of GD‑MS operation, including:
- Principle of GD‑MS: plasma generation using an inert support gas (normally argon), DC or RF potential between cathode (sample) and anode, sputtering, ionisation and extraction to a mass analyser (magnetic sector or time‑of‑flight).
- Ion source types: low‑flow (“static”) sources and fast‑flow sources with pin and flat sample geometries; guidance on gas flow, cooling and heat transfer for reliable operation.
- Apparatus details: ion source design, mass analyser options, detector systems and recommended vacuum/potential arrangements.
- Routine operations: system cleaning, support gas handling (purity recommendations), sample mounting and preventive maintenance.
- Calibration and checks: mass calibration, detector calibration and routine performance checks to ensure data quality.
- Data acquisition: sample preparation, procedure setup and data collection workflows tailored to different GD‑MS systems.
- Quantification methods: element integral calculation, ion beam ratios, fully quantitative and semi‑quantitative approaches, and hybrid analysis strategies.
The specification provides practical parameters (e.g., typical potentials, cooling approaches, and gas flow regimes) and warns that procedures can vary between manufacturers.
Applications and users
ISO/TS 15338:2025 is useful for laboratories and professionals performing:
- Surface chemical analysis and depth profiling
- Trace and bulk elemental analysis of metals, alloys, coatings and advanced materials
- Quality control and failure analysis in metallurgy, semiconductor and coating industries
- Research in materials science where GD‑MS is used for sensitive elemental measurement
Primary users include GD‑MS instrument operators, laboratory managers, analytical chemists, QA/QC engineers and standards/technical staff responsible for method development and instrument validation.
Related standards
- Prepared by ISO/TC 201 (Surface chemical analysis), Subcommittee SC 8 (Glow discharge spectroscopy).
- This edition cancels and replaces ISO/TS 15338:2020.
- Intended to be used together with manufacturers’ manuals and other ISO surface analysis guidance documents.